Dry Etching Technology for Semiconductors PDF free download | applied electronics engineering

Latest

Dry Etching Technology for Semiconductors PDF free download

By Applied Electronics - Wednesday, February 8, 2017 No Comments
Here you can get Dry Etching Technology for Semiconductors PDF free download link. This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits and microchip fabrication. The book describes the essentials of semiconductor fabrication process and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

Dry Etching Technology for Semiconductors PDF free download

Dry Etching Technology for Semiconductors PDF free download link:

http://noteable.site/30m/Dry_Etching_Technology_for_semiconductor.pdf

No Comment to " Dry Etching Technology for Semiconductors PDF free download "